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  • ALD/CVD Precursor
    • DIPAS丨CAS 908831-34-5
      DIPAS丨CAS 908831-34-5
      CAS: 908831-34-5
      Chemical Formula: C6H17NSi
      Abbreviation: DIPAS

      DIPAS is a liquid aminosilane precursor used for the low-temperature deposition of silicon-based dielectric thin films. Its vapor delivery characteristics and surface reactivity support thermal atomic layer deposition (Thermal ALD) and PEALD processes for depositing SiO₂ and SiNₓ, making it particularly suitable for applications requiring a reduced thermal budget and precise control over film growth.
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    • TDMAHf丨CAS 19782-68-4
      TDMAHf丨CAS 19782-68-4
      CAS: 19782-68-4
      Chemical Formula: C8H24HfN4
      Abbreviation: TDMAHf
       
      Tetrakis(Dimethylamino) Hafnium is a low-melting-point hafnium precursor suitable for controlled vapor-phase delivery in ALD/CVD processes. Its melting point range of 26–29°C allows for mild source heating, while the chemical characteristics of its alkylamido groups facilitate the deposition of HfO₂ (for high-k dielectric layers) and other hafnium-based thin films.
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    • TEMAHf丨CAS 352535-01-4
      TEMAHf丨CAS 352535-01-4
      CAS: 352535-01-4
      Molecular Formula: C12H32HfN4
      Abbreviation: TEMAHf; TEMAH
       
      Tetrakis(Ethylmethylamino) Hafnium is a liquid hafnium precursor designed for controlled vapor-phase delivery in ALD/CVD processes; it offers a practical technical approach for the fabrication of HfO₂ high-k dielectrics and Hf-Zr-O films that require precise control over precursor dosage and film composition.
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    • Hafnium Chloride丨CAS 13499-05-3
      Hafnium Chloride丨CAS 13499-05-3
      CAS: 13499-05-3
      Molecular Formula: HfCl4
       
      Hafnium chloride is an important inorganic compound, typically appearing as a white to slightly yellow crystalline solid with high hygroscopicity. It is a key raw material in many industrial and scientific fields, widely used in ALD/CVD deposition, hafnium compound synthesis, and research applications.
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    • Optoelectronic Materials
      • Organic Ligands
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        ABOUT US
        Fujian Wolfa Biotechnology Co., Ltd. is a global supplier of advanced organometallic precursors and high-purity specialty chemical materials, serving semiconductor, advanced manufacturing, and functional materials industries. We provide stable and scalable supply for high-performance applications.

        Leveraging proprietary synthesis, purification, and manufacturing capabilities, we integrate R&D, production, and controlled supply chain resources to deliver consistent, high-quality materials.
        OUR PARTNERS
        Wolfa has established long-term partnerships with leading companies in the semiconductor, advanced manufacturing, and high-end materials sectors. Leveraging our consistent quality, rapid response, and technological synergy, we continuously provide reliable support to our global customers.
         
        Our products have served customers in global innovation hubs such as the United States, Japan, South Korea, Switzerland, and India. Looking ahead, we will grow together with our partners, driving technological advancement with reliable materials and customized solutions.
        LATEST NEWS
        Main Challenges of TDMAH in ALD Processes.png
        ALD/CVD Precursors

        What Are the Main Challenges When Using TDMAH in ALD Processes?

        Explore key TDMAH challenges in ALD HfO2 processes, including vapor delivery, moisture sensitivity, ALD window, ligand removal and film impurities.

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        Why Does Silicon Tetrachloride Cause Vaporizer Clogging.png
        ALD/CVD Precursors

        Why Does Silicon Tetrachloride Cause Vaporizer Clogging?

        Silicon Tetrachloride is volatile, but moisture ingress, hydrolysis, silica-like deposits, HCl corrosion, and cold spots can still cause vaporizer clogging in real delivery systems.

        / Read More
        What Is Tris(methylcyclopentadienyl)yttrium.png
        ALD/CVD Precursors

        What Is Tris(methylcyclopentadienyl)yttrium?

        A practical guide to Y(MeCp)3, covering its identity, ALD relevance, yttrium-containing thin films, safety handling and supply considerations.

        / Read More
        Contact Our Technical Team
        We’d love to hear from you.  Whether you have questions about our products, need technical support, or want to explore new opportunities, our team is here to assist you. Reach out to us today, and we’ll provide the expert guidance and tailored solutions you need. 
         
        We typically respond within 24 hours.
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        CONTACT US

         Phone：+86 18050950397
         Email： jomin@wolfachem.com
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        Address: 3901 Sansheng Tuscany, Nanyu Town, Minhou County, Fuzhou City, Fujian Province

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