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| Synonyms | Chiralyst P291;2,4-dimethanidylpentane, ruthenium;Bis(2,4-dimethylpentadienyl)ruthenium(II);BIS(H5-2,4-DIMETHYLPENTADIENYL)RUTHENIUM(II);Ru(DMPD)2 |
| Molecular Formula | C14H22Ru |
| Appearance | Yellow solid |
| Molecular Weight | 287.366 |
| Melting Point | 85℃ |
| Storage Conditions | Store in a tightly closed container in a cool, dry, and well-ventilated area |
| Purity | ≧99% |
| Package Information | 100g, 500g, 1kg, or customized |
Ru(DMPD)₂ provides a defined organoruthenium source for vapor-phase ruthenium thin-film chemistry.
Literature reports low-temperature Ru ALD using Ru(DMPD)₂ and oxygen, with nucleation affected by oxygen exposure.
Process conditions can support research into metallic ruthenium and ruthenium oxide thin-film deposition.
The compound fits ALD/CVD precursor screening for interconnect, electrode and hard-mask related applications.
Ru(DMPD)₂ is used in studies of ruthenium ALD, typically with oxygen-containing co-reactants and optimized pulse/purge conditions.
Bis(2,4-Dimethylpentadienyl)ruthenium is a candidate precursor for vapor-phase deposition of metallic Ru thin films.
Under suitable oxidizing conditions, Ru(DMPD)₂ can support research into RuO₂ thin films for conductive oxide applications.
Ruthenium is investigated for fine interconnects, liners and related advanced semiconductor metallization structures.
Ruthenium-containing films are studied in hard-mask, electrode and device-integration research where conductivity and stability matter.
Store under dry, inert conditions when high purity and stable delivery performance are required.
Avoid contact with strong oxidizing agents, which may increase reaction or decomposition risks.
Use only in a fume hood, glovebox or well-ventilated laboratory area.
Wear suitable gloves, lab coat, protective eyewear and face protection when handling Ru(DMPD)₂.
Skin contact may cause irritation; wash with soap and water and remove contaminated clothing.
Eye contact may cause serious irritation; rinse cautiously with water and seek medical advice.
For spills, collect carefully with inert material and prevent release into drains or waterways.
Do not overheat the precursor during delivery; decomposition may affect film quality and safety.
1. Can Ru(DMPD)₂ be used for ruthenium ALD?
Yes. Published studies report ALD of ruthenium using Bis(2,4-Dimethylpentadienyl)ruthenium and oxygen, but the process window depends on substrate, oxygen exposure, pressure and temperature.
2. How should Ru(DMPD)₂ be stored?
Store it tightly sealed in a cool, dry place, preferably under inert atmosphere for electronic-grade use. Follow the supplier SDS and lot-specific storage recommendation.
3. Is Ru(DMPD)₂ suitable for semiconductor precursor screening?
Yes, it is a relevant ruthenium precursor candidate for ALD/CVD screening. However, final suitability must be validated in the customer’s actual tool and process.
4. Can Ru(DMPD)₂ replace Ru(EtCp)₂ directly?
Not directly without requalification. Ru(DMPD)₂ and Ru(EtCp)₂ differ in volatility, thermal behavior and deposition chemistry, so process conditions must be re-optimized.
Wolfa professionally supplies this product, supporting small-batch sampling and large-volume procurement needs. Packaging options include ordinary glass bottles, glass ampoules, metal ampoules, etc.
For product analysis reports (such as COA) or procurement consulting, please feel free to contact us at jomin@wolfachem.com at any time.
