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| Synonyms | Ni(TMHD)₂;SKL662;NICKEL TMHD;[Nickel(II) thd];Nickel bis(dipivaloylmethanate);Nickel tetramethylheptanedionate(Ni(thd)2);Bis(2,2,6,6-tetramethyl-3,5-heptanedionato)nickel |
| Molecular Formula | C22H38NiO4 |
| Appearance | Purple crystalline |
| Molecular Weight | 425.23 |
| Melting Point | 219-223 °C(lit.) |
| Boiling Point | 90-110°C/0.1mm |
| Flash Point | 90-110°C/0.1mm subl. |
| Storage Conditions | Under inert gas (nitrogen or Argon) at 2-8℃ |
| Purity | ≧98% |
| Package Information | 100g, 500g, 1kg, or customized |
Bulky TMHD ligands support vapor-phase delivery for ALD and CVD precursor screening.
Reported sublimation at reduced pressure helps evaluate heated source delivery and bubbler operation.
Ni(thd)₂ has been reported for nickel oxide ALD with water as the co-reactant.
Ni(TMHD)₂ can be used for ALD-based preparation of supported nickel catalyst materials.
The ligand framework avoids halide-related contamination concerns common to some inorganic nickel salts.
Ni(TMHD)₂ is used as a nickel precursor in NiO ALD studies, including processes using water or oxygen-containing co-reactants.
Bis(2,2,6,6-tetramethyl-3,5-heptanedionato)nickel(II) can be evaluated for vapor-phase nickel or nickel oxide film deposition.
Nickel and nickel oxide films are relevant to microelectronics, contacts, functional coatings and device-oriented material research.
NiO thin films are studied in optoelectronic and energy-related structures where p-type oxide behavior is useful.
Ni(TMHD)₂ is also listed as an NMR shift reagent and coordination compound for laboratory research.
Avoid inhaling dust, fumes, vapors or aerosols during weighing, transfer or heated delivery.
Wear protective gloves, lab coat, eye protection and suitable respiratory protection when exposure may occur.
This nickel compound may cause an allergic skin reaction; avoid direct skin contact.
If skin contact occurs, wash with plenty of soap and water and remove contaminated clothing.
If inhaled, move the person to fresh air and seek medical attention if symptoms occur.
Keep away from strong oxidizing agents and incompatible chemicals during storage and handling.
Store the container tightly closed, preferably under inert atmosphere for high-purity applications.
1. Is Ni(TMHD)₂ a solid or liquid precursor?
Ni(TMHD)₂ is a solid precursor, commonly described as crystalline powder or solid. Heated source delivery is usually required for vapor-phase deposition evaluation.
2. Can Ni(TMHD)₂ be used for nickel oxide ALD?
Yes. Ni(thd)₂ has been reported in ALD studies for nickel oxide films, including Ni(thd)₂/H₂O precursor combinations. Actual performance depends on reactor design, temperature, pulse time and substrate.
3. Can Ni(TMHD)₂ deposit metallic nickel films directly?
It may be evaluated for nickel-containing films, but metallic Ni deposition usually requires suitable reducing chemistry or plasma-assisted conditions. It should not be treated as a plug-and-play replacement for other nickel precursors.
4. What is the difference between Ni(TMHD)₂ and Ni(acac)₂?
Both are nickel β-diketonate complexes, but Ni(TMHD)₂ has bulkier tert-butyl-substituted ligands. This can improve volatility and vapor-phase handling compared with less bulky β-diketonates, but process testing is still required.
Wolfa professionally supplies this product, supporting small-batch sampling and large-volume procurement needs. Packaging options include ordinary glass bottles, glass ampoules, metal ampoules, etc.
For product analysis reports (such as COA) or procurement consulting, please feel free to contact us at jomin@wolfachem.com at any time.
