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| Synonyms | Nickel(II) 1-dimethylamino-2-methyl-2-butoxide;Bis(dimethylamino-2-methyl-2-butoxy)nickel;Bis(dimethylamino-2-methyl-2-butoxo)nickel Ni(dmamb)2 |
| Molecular Formula | C14H32N2NiO2 |
| Molecular Weight | 319.10948 |
| Purity | 99%，Ni-99.9999% |
| Package Information | 100g, 500g, 1kg, or customized |
Ni(dmamb)₂ is a volatile nickel aminoalkoxide precursor used in nickel, nickel oxide and nickel sulfide thin-film studies.
The dmamb ligand provides both oxygen and nitrogen donor sites, supporting volatility and metal-ligand stability.
Ni(dmamb)₂ has been evaluated with reactants such as H₂O, H₂S, H₂ plasma and NH₃ plasma in deposition research.
Water, oxygen exposure, residual impurities and batch consistency can strongly affect vapor delivery, film composition and reproducibility.
Ni(dmamb)₂ can be used as a nickel source in ALD or PEALD studies for nickel metal thin films.
With oxidants such as H₂O or ozone, this precursor may be evaluated for NiO thin-film formation.
Ni(dmamb)₂ has been reported with H₂S for low-temperature ALD of nickel sulfide thin films.
Nickel-based films are relevant to contacts, electrodes, nickel silicide formation and functional thin-film structures.
Ni(dmamb)₂ is moisture-sensitive and may react with water, causing precursor degradation and safety risk. Store and transfer under dry nitrogen or argon to reduce hydrolysis and oxidation.
Ampoules, bubblers, valves, syringes and transfer lines must be dry before use.
Keep away from heat, sparks, open flames and hot surfaces during handling and storage.
Handle in a fume hood, glovebox or closed precursor delivery system to reduce exposure.
Dispose of residues as water-reactive nickel-containing organometallic hazardous waste according to local regulations.
1. What is Ni(dmamb)₂ used for?
Ni(dmamb)₂ is mainly used as a nickel ALD/CVD precursor for nickel, nickel oxide and nickel sulfide thin-film research.
2. Can Ni(dmamb)₂ be used for nickel metal ALD?
Yes, it has been studied as a nickel precursor in ALD and plasma-enhanced ALD processes. Film quality depends on reactant, plasma chemistry and process window.
3. Can Ni(dmamb)₂ be used for NiO or nickel sulfide films?
Yes. Ni(dmamb)₂ has been reported with H₂O or H₂S for ALD of nickel oxide and nickel sulfide thin films.
4. What reactants are used with Ni(dmamb)₂?
Reported reactants include H₂O, H₂S, H₂ plasma and NH₃ plasma. The best choice depends on target film, impurity limits and deposition temperature.
Wolfa professionally supplies this product, supporting small-batch sampling and large-volume procurement needs. Packaging options include ordinary glass bottles, glass ampoules, metal ampoules, etc.
For product analysis reports (such as COA) or procurement consulting, please feel free to contact us at jomin@wolfachem.com at any time.
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